precise control sputtering targets

Brand Name:JINCHENG

Model Number:JC-SYAN

Place of Origin:CHINA

...range of targeted applications. Whether you need to reach difficult areas or spray specific spots with accuracy, this sprayer with an extension tube is the perfect solution. The extension ...

Categories:Metal Sputtering Target

Country/Region:china

... that the target stays in place during the sputtering process, resulting in a high-quality output. The Metal Sputtering Target is made with 99.99% purity, ensuring that it is free from impurities that may affect the quality of the output. This makes it

Brand Name:JINXING

Model Number:Copper Sputtering Target

Place of Origin:China

... for integrated circuits. Purity: 99.999% ~ 99.9999% For precise control of impurity content, Ag content can be controlled below 0.1ppm and s content below 0.02ppm The content of gas elements (C, O, N, H) is less than 1ppm Main uses: 6N copper has some

Brand Name:N/M

Model Number:CDX-TB-2021-012

Place of Origin:China

... target (purity: 99.9%-99.999%) Titanium target plate High-purity and high-density titanium sputtering target Titanium target Titanium sputtering target material Used for liquid crystal display, laser memory, electronic controller, sputtering thin

Brand Name:ZKTD

Model Number:OEM

Place of Origin:China

The Factory Supplies High-Precision Silica Sputtering Target The network structure of SiO2 determines its excellent physical and chemical properties. In addition, SiO2 is widely existed in nature and has been widely used by ...

Brand Name:LHTi

Model Number:LH-Target

Place of Origin:Baoji, China

...performance and longevity of numerous products. These targets are widely utilized across industries, including electronics, semiconductors, and military aerospace, where precision is paramount. The Importance of Titanium Sputter Targets In the realm of

Brand Name:Sanhui

Model Number:Mo1

Place of Origin:Henan, China

...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering

Brand Name:Feiteng

Model Number:Titanium tube target

Place of Origin:Baoji, Shaanxi, China

...Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium Plate target Size OD127*ID458*10 Pure Pure>3N5 Packaging Vacuum package in wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Related product magnetron sputtering target Rotary Target ito rotary target Titanium Rotary Target Vacuum Package Rotary Target titanium sputtering target Vacuum Coating Target...

Brand Name:ZG

Model Number:MS

Place of Origin:CHINA

... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and

Categories:Molybdenum Products

Country/Region:china

... Sputtering Target Molybdenum Sputtering Target 10.2g/Cm3 Molybdenum Plate 10.2g/Cm3 Send Email Inquiry Now Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets are mainly used for flat panel displays,

Brand Name:PRM

Model Number:custom

Place of Origin:China

... from molybdenum powder. In most cases, it is made from the anode itself, which is sintered molybdenum powder, and the target is formed by the anode. Anodes can be stationary or rotating anodes. Other standard methods, chemical vapor deposition, or again,

Brand Name:TORICH

Model Number:304L

Place of Origin:China

Torich 133*4*4113mm 304L Planar Sputtering Target Sputtering Target Stainless Steel Tube Torich 133*4*4113mm 304L Sputtering Target Stainless Steel Tube Grade:304L Specification: 133*4*4113mm Tolerance of OD:0.1-0.4mm Tolerance of ID:124.5-125.2mm ...

Brand Name:PRM

Model Number:custom

Place of Origin:China

Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron sputtering targets is mainly by infiltration method. First, molybdenum powder...

Brand Name:FGD

Model Number:fgd t-002

Place of Origin:China

...sputtering target Plate Planar Billet for Semiconductor Physical Vapor Deposition Tungsten-titanium (WTi) films are known to act as the effective diffusion barrier between Al and Si in semiconductor and photovoltaic cells industry. WTifilms are typically deposited as thin films by physical vapor deposition (PVD) through sputtering of a WTialloy target. It is desirable to produce a target...

Brand Name:HMD

Model Number:NONE

Place of Origin:CHN

...Sputtering Target plate sheets Product Description - uniform grain with densified microstructure ensures longer use time. - High special strenghth, high melt point - excellent corrosive resistance, good thermal resistance. - professional after-sales service Commodity Name Pure molybdenum sputtering target...

Brand Name:TOBO

Model Number:NI 200

Place of Origin:China

NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's requirements Technique Hot rolled cold rolled Length as customer's request Surface ...

Brand Name:GNEE

Model Number:TiP0001

Place of Origin:Henan

Pure Titanium 99.99% 4n Disc High Purity Ti Metal Sputtering Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main characteristics of titanium are low density, high mechanical strength and ...

Brand Name:chengyue

Model Number:7075

Place of Origin:China

Aluminum Sheet Customized Aluminum Sheets Metal Aluminum Price Al Sputtering Target Applications of 7075 Aluminum Type 7075 aluminum is one the strongest aluminum alloys. Its high yield strength (>500 MPa) and its low density make the material a fit for ...